On the Origin of Sinter‐Resistance and Catalyst Accessibility in Raspberry‐Colloid‐Templated Catalyst Design

Nanoparticle (NP) sintering is a major cause of the deactivation supported catalysts. Raspberry-colloid-templated (RCT) catalysts are an emerging class materials that show unprecedented level sinter-resistance and exhibit high catalytic activity. Here comprehensive study origin NP stability accessibility in RCT using theoretical modeling, 3D electron microscopy, epitaxial overgrowth reported. The approach showcased for silica-based containing dilute Pd-in-Au NPs previously used hydrogenation oxidation catalysis. Modeling contact line silica precursor infiltrating into assembled raspberry colloids suggests large part particles must be embedded silica, which confirmed by quantitative visualization >200 individual dual-axis tomography. have unique structure all reside at pore wall but >50% their surface matrix, giving rise to strongly enhanced thermal mechanical stability. Importantly, Ag on reveals not only exposed interface as well remained chemically accessible. This mechanistic understanding provides valuable guidance design stable materials.